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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2011, Volume 37, Issue 5, Pages 72–80
(Mi pjtf9103)
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This article is cited in 33 scientific papers (total in 33 papers)
Synthesis of Ti$_3$Al and TiAl based surface alloys by pulsed electron-beam melting of Al(film)/Ti(substrate) system
V. P. Rotshteinab, Yu. F. Ivanovab, Yu. A. Kolubaevaab, X. Meic, A. B. Markovab, E. P. Naidenab, G. E. Ozurab, K. V. Oskomovab, S. A. Popovab, E. L. Pryadkoab, A. D. Teresovab, V. A. Shulovd a Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, Tomsk
b Tomsk State University
c Dalian University of Technology
d Moscow Aviation Institute
Abstract:
Phase formation and surface hardening in the 100-nm-thick Al(film)/Ti(substrate) system under conditions of pulsed electron-beam melting ($\sim$15 keV, $\sim$3 $\mu$s, 3–4 J/cm$^2$) have been studied depending on the number of film deposition-melting cycles. Using this method, submicrocrystalline and nanocrystalline surface alloys with thicknesses $\ge$ 3 $\mu$m based on Ti$_3$Al and TiAl intermetallics have been obtained on the titanium substrate.
Received: 06.10.2010
Citation:
V. P. Rotshtein, Yu. F. Ivanov, Yu. A. Kolubaeva, X. Mei, A. B. Markov, E. P. Naiden, G. E. Ozur, K. V. Oskomov, S. A. Popov, E. L. Pryadko, A. D. Teresov, V. A. Shulov, “Synthesis of Ti$_3$Al and TiAl based surface alloys by pulsed electron-beam melting of Al(film)/Ti(substrate) system”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 37:5 (2011), 72–80; Tech. Phys. Lett., 37:3 (2011), 226–229
Linking options:
https://www.mathnet.ru/eng/pjtf9103 https://www.mathnet.ru/eng/pjtf/v37/i5/p72
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