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Publications in Math-Net.Ru |
Citations |
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2025 |
| 1. |
V. P. Popov, V. A. Antonov, V. E. Zhilitskii, A. A. Lomov, A. V. Myakonkikh, K. V. Rudenko, “Thermally stable ferroelectric HfO$_2$ : Al$_2$O$_3$ (10:1) in silicon-on-insulator and silicon-on-sapphire heterostructures after rapid thermal annealing treatments and oxidation-induced silicon thinning”, Pis'ma v Zh. Èksper. Teoret. Fiz., 121:12 (2025), 945–951  ; JETP Letters, 121:12 (2025), 902–908 |
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2023 |
| 2. |
O. O. Permyakova, A. E. Rogozhin, A. V. Myakon'kikh, K. V. Rudenko, “Low resistance state degradation during endurance measurements in HfO$_2$(8 םל)/HfO$_X$N$_Y$-based structures”, Fizika i Tekhnika Poluprovodnikov, 57:6 (2023), 451–454  |
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2018 |
| 3. |
A. V. Fadeev, K. V. Rudenko, “Atomic layer deposition of thin films onto 3$D$ nanostructures: the effect of wall tilt angle and aspect ratio of trenches”, Zhurnal Tekhnicheskoi Fiziki, 88:10 (2018), 1573–1580 ; Tech. Phys., 63:10 (2018), 1525–1532 |
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| 4. |
A. V. Fadeev, K. V. Rudenko, “Analytical model for atomic-layer deposition of thin films on the walls of cylindrical holes with a relatively high aspect ratio”, Zhurnal Tekhnicheskoi Fiziki, 88:8 (2018), 1264–1272 ; Tech. Phys., 63:8 (2018), 1228–1235 |
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| 5. |
A. V. Fadeev, A. V. Myakon'kikh, K. V. Rudenko, “Analytical model of atomic layer deposition of films on 3D structures with high aspect ratios”, Zhurnal Tekhnicheskoi Fiziki, 88:2 (2018), 243–250 ; Tech. Phys., 63:2 (2018), 235–242 |
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2016 |
| 6. |
V. P. Popov, M. A. Ilnitskii, E. D. Zhanaev, A. V. Myakon'kikh, K. V. Rudenko, A. V. Glukhov, “Biosensor properties of SOI nanowire transistors with a PEALD Al$_{2}$O$_{3}$ dielectric protective layer”, Fizika i Tekhnika Poluprovodnikov, 50:5 (2016), 643–649 ; Semiconductors, 50:5 (2016), 632–638 |
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