|
|
|
Publications in Math-Net.Ru |
Citations |
|
2025 |
| 1. |
L. V. Stepanov, P. S. Antsiferov, N. D. Matyukhin, “Damped vacuum discharge as a variant of EUV radiation source for lithography”, Zhurnal Tekhnicheskoi Fiziki, 95:7 (2025), 1297–1302 |
|
2023 |
| 2. |
P. S. Antsiferov, L. A. Dorokhin, V. M. Makarova, “The grazing incidence reflection coefficient measurement with the usage of single channel scheme”, Optics and Spectroscopy, 131:8 (2023), 1074–1079 |
|
2019 |
| 3. |
D. B. Abramenko, P. S. Antsiferov, D. I. Astakhov, A. Yu. Vinokhodov, I. Yu. Vichev, R. R. Gayazov, A. S. Grushin, L. A. Dorokhin, V. V. Ivanov, D. A. Kim, K. N. Koshelev, P. V. Krainov, M. S. Krivokorytov, V. M. Krivtsun, B. V. Lakatosh, A. A. Lash, V. V. Medvedev, A. N. Ryabtsev, Yu. V. Sidelnikov, E. P. Snegirev, A. D. Solomyannaya, M. V. Spiridonov, I. P. Tsygvintsev, O. F. Yakushev, A. A. Yakushkin, “Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection (50th anniversary of the Institute of Spectroscopy, Russian Academy of Sciences)”, UFN, 189:3 (2019), 323–334 ; Phys. Usp., 62:3 (2019), 304–314 |
22
|
|
2018 |
| 4. |
P. S. Antsiferov, L. A. Dorokhin, R. R. Kildiyarova, “VUV radiation of xenon in a fast conical discharge”, Optics and Spectroscopy, 125:4 (2018), 457–462 ; Optics and Spectroscopy, 125:4 (2018), 476–481 |
1
|
|
| Organisations |
|
|