| 1. |
V. P. Popov, V. A. Antonov, V. E. Zhilitskii, A. A. Lomov, A. V. Myakonkikh, K. V. Rudenko, “Thermally stable ferroelectric HfO$_2$ : Al$_2$O$_3$ (10:1) in silicon-on-insulator and silicon-on-sapphire heterostructures after rapid thermal annealing treatments and oxidation-induced silicon thinning”, Pis'ma v Zh. Èksper. Teoret. Fiz., 121:12 (2025), 945–951  ; JETP Letters, 121:12 (2025), 902–908 |
