Reactions of Thermalized Fluorine Atoms with CH4 and CH3, Trapped in an Argon Matrix at 13–20 K

Accumulation and conversion of CH₃ radicals upon F₂ photolysis in ternary mixtures Ar:F₂:CH₄ has been studied with EPR spectroscopy; the CH₃ radical formation during photolysis period is caused by the reaction of’hot’ F atoms with CH₄. At T > 18 K the thermally activated reaction of ’cold’ F atoms with CH₄ was also detected; the activation energy of diffusion-controlled recombination of the F atoms falls short of that of F + CH₄ reaction.