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Эта публикация цитируется в 4 научных статьях (всего в 4 статьях)
Novel Photochemical Crosslinking Polymer Systems with High Sensitivity for Negative Resist Applications
A. V. Vannikov, A. D. Grishina, M. G. Tedoradze
A.N. Frumkin Institute of Electrochemistry, Russian Academy of Sciences, Moscow, Russian Federation
Аннотация:
A process of both photochemical and thermally induced chemical amplification of the effect of primary light irradiation has been realized in the photochemical crosslinking of polyvinylethylal layers containing diphenylbenzylamine and hexabromodimethylsulphone, allowing us to obtain new highly sensitive photoresists.
Образец цитирования:
A. V. Vannikov, A. D. Grishina, M. G. Tedoradze, “Novel Photochemical Crosslinking Polymer Systems with High Sensitivity for Negative Resist Applications”, Mendeleev Commun., 1:1 (1991), 34–36
Образцы ссылок на эту страницу:
https://www.mathnet.ru/rus/mendc5481 https://www.mathnet.ru/rus/mendc/v1/i1/p34
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