Effect of low-pressure radio-frequency air plasma on chitosan films

The effect of low-frequency (15 kHz), low-pressure (10 Pa) air plasma treatment on freshly prepared chitosan films at processing times from 3 to 10 min has been explored. The films were prepared using chitosan solutions in dilute acetic acid. The influence of the plasma exposure time on the composition, morphology, and hydrophilic properties of the film surfaces is discussed.