| 1. |
V. V. Voitovych, R. N. Rudenko, A. G. Kolosiuk, M. M. Krasko, V. O. Juhimchuk, M. V. Voitovich, S. S. Ponomarev, A. M. Kraitchinskii, V. Yu. Povarchuk, V. A. Makara, “Effect of tin on the processes of silicon-nanocrystal formation in amorphous SiO$_x$ thin-film matrices”, Fizika i Tekhnika Poluprovodnikov, 48:1 (2014), 77–80   ; Semiconductors, 48:1 (2014), 73–76 |
8
|
