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This article is cited in 3 scientific papers (total in 3 papers)
XXII International symposium ''Nanophysics and Nanoelectronics'', Nizhny novgorod, March, 12-15, 2018
Phosphorus-based nanowires grown by molecular-beam epitaxy on silicon
G. E. Cirlinabcd, R. R. Reznikc, Yu. B. Samsonenkoab, A. I. Khrebtovac, K. P. Kotlyara, I. V. Ilkiva, I. P. Sotnikovabd, D. A. Kirilenkod, N. V. Kryzhanovskayaa a Federal State Budgetary Institution of Higher Education and Science Saint Petersburg National Research Academic University of the Russian Academy of Sciences, St. Petersburg
b Institute for Analytical Instrumentation, Russian Academy of Sciences, St. Petersburg
c St. Petersburg National Research University of Information Technologies, Mechanics and Optics
d Ioffe Institute, St. Petersburg
Abstract:
Data on the growth and physical properties of nanostructures of the type “InAsP insert embedded in InP nanowire (NW)” grown on Si (111) surfaces by Au-assisted molecular-beam epitaxy are presented. It is found that nearly 100%-coherent NWs can be grown with a widely varying surface density. A relationship between the optical and structural properties of the NWs is revealed. It is shown that the NWs under study are formed of a purely wurtzite phase. The suggested technology opens up new opportunities for the integration of direct-gap III–V materials and silicon.
Keywords:
Molecular Beam Epitaxy (MBE), Nanowires (NWs), Wurtzite Phase, Average Arsenic Content, Triple Boundary.
Received: 25.04.2018 Accepted: 07.05.2018
Citation:
G. E. Cirlin, R. R. Reznik, Yu. B. Samsonenko, A. I. Khrebtov, K. P. Kotlyar, I. V. Ilkiv, I. P. Sotnikov, D. A. Kirilenko, N. V. Kryzhanovskaya, “Phosphorus-based nanowires grown by molecular-beam epitaxy on silicon”, Fizika i Tekhnika Poluprovodnikov, 52:11 (2018), 1304–1307; Semiconductors, 52:11 (2018), 1416–1419
Linking options:
https://www.mathnet.ru/eng/phts5685 https://www.mathnet.ru/eng/phts/v52/i11/p1304
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