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This article is cited in 4 scientific papers (total in 4 papers)
Semiconductor structures, low-dimensional systems, quantum phenomena
X-ray diffraction analysis of features of the crystal structure of GaN/Al$_{0.32}$Ga$_{0.68}$N HEMT-heterostructures by the Williamson–Hall method
S. S. Pushkareva, M. M. Grekhovb, N. V. Zenchenkoa a V. G. Mokerov Institute of Ultra High Frequency Semiconductor Electronics of RAS, Moscow
b National Engineering Physics Institute "MEPhI", Moscow
Abstract:
The fitting of $\theta$/2$\theta$ and $\omega$ peaks in X-ray diffraction curves is shown to be most accurate in the case of using an inverse fourth-degree polynomial or probability density function with Student's distribution (Pearson type VII function). These functions describe well both the highest-intensity central part of the experimental peak and its low-intensity broadened base caused by X-ray diffuse scattering. The mean microdeformation $\varepsilon$ and mean vertical domain size $D$ are determined by the Williamson–Hall method for layers of GaN
($\varepsilon\approx$ 0.00006, $D\approx$ 200 nm) and Al$_{0.32}$Ga$_{0.68}$N ($\varepsilon$ = 0.0032 $\pm$ 0.0005, $D$ = 24 $\pm$ 7 nm). The $D$ value obtained for the Al$_{0.32}$Ga$_{0.68}$N layer is most likely to result from the nominal thickness of this layer, which is 11 nm.
Received: 06.06.2017 Accepted: 19.06.2017
Citation:
S. S. Pushkarev, M. M. Grekhov, N. V. Zenchenko, “X-ray diffraction analysis of features of the crystal structure of GaN/Al$_{0.32}$Ga$_{0.68}$N HEMT-heterostructures by the Williamson–Hall method”, Fizika i Tekhnika Poluprovodnikov, 52:6 (2018), 586–590; Semiconductors, 52:6 (2018), 734–738
Linking options:
https://www.mathnet.ru/eng/phts5806 https://www.mathnet.ru/eng/phts/v52/i6/p586
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