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Fizika i Tekhnika Poluprovodnikov, 2016, Volume 50, Issue 5, Pages 711–716
(Mi phts6478)
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This article is cited in 5 scientific papers (total in 5 papers)
Manufacturing, processing, testing of materials and structures
On the laser detachment of $n$-GaN films from substrates, based on the strong absorption of IR light by free charge carriers in $n^+$-GaN substrates
M. V. Virkoa, V. S. Kogotkova, A. A. Leonidova, V. V. Voronenkovb, Yu. T. Rebaneb, A. S. Zubrilovb, R. I. Gorbunovb, F. E. Latyshevb, N. I. Bochkarevab, Yu. S. Lelikovb, D. V. Tarkhinb, A. N. Smirnovb, V. Yu. Davydovb, Yu. G. Shreterb a Peter the Great St. Petersburg Polytechnic University
b Ioffe Institute, St. Petersburg
Abstract:
The physical and technological basics of the method used to lift off lightly and moderately doped $n$-GaN films from heavily doped
$n^+$-GaN substrates are considered. The detachment method is based on the free-charge-carrier absorption of IR laser light, which is substantially higher in $n^+$-GaN films.
Keywords:
Device Structure, Free Charge Carrier, Gallium Nitride, Sacrificial Layer, Liquid Gallium.
Received: 22.10.2015 Accepted: 26.10.2015
Citation:
M. V. Virko, V. S. Kogotkov, A. A. Leonidov, V. V. Voronenkov, Yu. T. Rebane, A. S. Zubrilov, R. I. Gorbunov, F. E. Latyshev, N. I. Bochkareva, Yu. S. Lelikov, D. V. Tarkhin, A. N. Smirnov, V. Yu. Davydov, Yu. G. Shreter, “On the laser detachment of $n$-GaN films from substrates, based on the strong absorption of IR light by free charge carriers in $n^+$-GaN substrates”, Fizika i Tekhnika Poluprovodnikov, 50:5 (2016), 711–716; Semiconductors, 50:5 (2016), 699–704
Linking options:
https://www.mathnet.ru/eng/phts6478 https://www.mathnet.ru/eng/phts/v50/i5/p711
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