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Fizika i Tekhnika Poluprovodnikov, 2023, Volume 57, Issue 8, Pages 620–623 DOI: https://doi.org/10.61011/FTP.2023.08.56955.5049C
(Mi phts6932)
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International Physics Conference, St. Petersburg, October 23-27, 2023, St. Petersburg
Selective area epitaxy of InP/GaInP$_2$ quantum dots from metal-organic compounds
A. S. Vlasova, K. M. Afanaseva, A. I. Galimova, N. A. Kalyuzhnyya, D. V. Lebedeva, A. V. Malevskayaa, S. A. Mintairova, M. V. Rakhlina, R. A. Saliia, A. M. Mozharovb, I. S. Mukhinb, A. M. Mintairovac a Ioffe Institute, 194021 St. Petersburg, Russia
b Alferov Federal State Budgetary Institution of Higher Education and Science Saint Petersburg National Research Academic University of the Russian Academy of Sciences, 194021 St. Petersburg, Russia
c University of Notre Dame, Indiana, USA 46556
DOI:
https://doi.org/10.61011/FTP.2023.08.56955.5049C
Abstract:
Experiments on the growth of self-assembled InP/GaInP$_2$ quantum dots in dielectric mask 0.1–1 $\mu$m apertures by MOVPE epitaxy have been carried out. A sequence of operations for the implementation of the lift-off lithography method is proposed and implemented. The possibility of obtaining apertures with 100 nm diameter and less is shown. Combination of thermally deposited SiO$_2$ and wet etching is shown to produce minimal amount of nonradiative defects and results in a stable PL signal from single QDs in the aperture.
Keywords:
InP quantum dots, selective area epitaxy, MOVPE epitaxy.
Received: 11.05.2023 Revised: 21.07.2023 Accepted: 30.10.2023
Citation:
A. S. Vlasov, K. M. Afanasev, A. I. Galimov, N. A. Kalyuzhnyy, D. V. Lebedev, A. V. Malevskaya, S. A. Mintairov, M. V. Rakhlin, R. A. Salii, A. M. Mozharov, I. S. Mukhin, A. M. Mintairov, “Selective area epitaxy of InP/GaInP$_2$ quantum dots from metal-organic compounds”, Fizika i Tekhnika Poluprovodnikov, 57:8 (2023), 620–623
Linking options:
https://www.mathnet.ru/eng/phts6932 https://www.mathnet.ru/eng/phts/v57/i8/p620
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| Statistics & downloads: |
| Abstract page: | 69 | | Full-text PDF : | 36 |
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