Fizika i Tekhnika Poluprovodnikov
RUS  ENG    JOURNALS   PEOPLE   ORGANISATIONS   CONFERENCES   SEMINARS   VIDEO LIBRARY   PACKAGE AMSBIB  
General information
Latest issue
Archive

Search papers
Search references

RSS
Latest issue
Current issues
Archive issues
What is RSS



Fizika i Tekhnika Poluprovodnikov:
Year:
Volume:
Issue:
Page:
Find






Personal entry:
Login:
Password:
Save password
Enter
Forgotten password?
Register


Fizika i Tekhnika Poluprovodnikov, 2022, Volume 56, Issue 1, Pages 134–138
DOI: https://doi.org/10.21883/FTP.2022.01.51824.9732
(Mi phts6983)
 

Semiconductor physics

Influence of chemical treatment and surface topology on the blocking voltage of GaAs thyristor mesastructures, grown by MOCVD

A. B. Chigineva, N. V. Baidus, S. M. Nekorkin, K. S. Zhidyaev, V. E. Kotomina, I. V. Samartsev

National Research Lobachevsky State University of Nizhny Novgorod, 603022 Nizhny Novgorod, Russia
Abstract: The effect of sulfide passivation (chemical treatment in a peroxide-sulfur etchant and in a solution of Na$_2$S in isopropanol) and complication of the profile of the lateral surface of thyristor mesastructures on the blocking ability of GaAs thyristor mesastructures is investigated. It is shown that the blocking voltage of the chips increases several times both after chemical treatment of the surface and with the complication of the surface topology.
Keywords: thyristors, blocking voltage, sulfide passivation, gallium arsenide, mesastructure.
Funding agency Grant number
Ministry of Science and Higher Education of the Russian Federation
In terms of development of technology of post-growth operations of the experimental samples the study was funded under the state assignment of the Lobachevsky State University of Nizhny Novgorod.
Received: 25.08.2021
Revised: 14.09.2021
Accepted: 14.09.2021
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: A. B. Chigineva, N. V. Baidus, S. M. Nekorkin, K. S. Zhidyaev, V. E. Kotomina, I. V. Samartsev, “Influence of chemical treatment and surface topology on the blocking voltage of GaAs thyristor mesastructures, grown by MOCVD”, Fizika i Tekhnika Poluprovodnikov, 56:1 (2022), 134–138
Citation in format AMSBIB
\Bibitem{ChiBaiNek22}
\by A.~B.~Chigineva, N.~V.~Baidus, S.~M.~Nekorkin, K.~S.~Zhidyaev, V.~E.~Kotomina, I.~V.~Samartsev
\paper Influence of chemical treatment and surface topology on the blocking voltage of GaAs thyristor mesastructures, grown by MOCVD
\jour Fizika i Tekhnika Poluprovodnikov
\yr 2022
\vol 56
\issue 1
\pages 134--138
\mathnet{http://mi.mathnet.ru/phts6983}
\crossref{https://doi.org/10.21883/FTP.2022.01.51824.9732}
\elib{https://elibrary.ru/item.asp?id=48311699}
Linking options:
  • https://www.mathnet.ru/eng/phts6983
  • https://www.mathnet.ru/eng/phts/v56/i1/p134
  • Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    Fizika i Tekhnika Poluprovodnikov Fizika i Tekhnika Poluprovodnikov
     
      Contact us:
     Terms of Use  Registration to the website  Logotypes © Steklov Mathematical Institute RAS, 2025