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Surface, interfaces, thin films
Influence of the oxygen during the deposition of an indium tin oxide thin film by magnetron sputtering for heterojunction solar cells
A. F. Ivanovab, F. S. Egorovb, N. D. Platonova, V. L. Matukhina, E. I. Terukovcd a Kazan State Power Engineering University
b OOO Khevel, Novocheboksarsk, Russia
c Saint Petersburg Electrotechnical University "LETI"
d Ioffe Institute, St. Petersburg
Abstract:
Optoelectronic properties of indium and tin oxide thin films depending on the oxygen content in the total gas flow were experimentally investigated during deposition of these films by DC magnetron target sputtering. Relationship of the heterojunction thin-film solar cell output parameters vs. oxygen partial pressure in a vacuum vessel was examined during indium and tin oxide layer deposition. The maximum photovoltaic conversion efficiency of the solar cell was achieved at an oxygen partial pressure in the vacuum vessel of $\sim$6.5 Torr.
Keywords:
heterojunction thin-film solar element, indium and tin oxide, magnetron sputtering.
Received: 27.09.2021 Revised: 01.10.2021 Accepted: 01.10.2021
Citation:
A. F. Ivanov, F. S. Egorov, N. D. Platonov, V. L. Matukhin, E. I. Terukov, “Influence of the oxygen during the deposition of an indium tin oxide thin film by magnetron sputtering for heterojunction solar cells”, Fizika i Tekhnika Poluprovodnikov, 56:3 (2022), 315–319
Linking options:
https://www.mathnet.ru/eng/phts7016 https://www.mathnet.ru/eng/phts/v56/i3/p315
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