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Fizika i Tekhnika Poluprovodnikov, 2015, Volume 49, Issue 3, Pages 376–378
(Mi phts7239)
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This article is cited in 9 scientific papers (total in 9 papers)
Semiconductor structures, low-dimensional systems, quantum phenomena
Electrical properties of Pd-oxide-InP structures
E. A. Grebenshchikovaa, V. V. Evstropova, N. D. Il'inskayaa, Yu. S. Mel'nikovb, O. Yu. Serebrennikovaa, V. G. Sidorovb, V. V. Sherstneva, Yu. P. Yakovleva a Ioffe Institute, St. Petersburg
b St. Petersburg State Polytechnic University, St. Petersburg, 195251, Russia
Abstract:
Pd-anodic oxide-InP metal-oxide-semiconductor (MOS) structures are fabricated to develop a hydrogen sensor capable of effectively operating at room temperature. The conduction mechanisms of the structures at 100–300 K are studied. It is found that the oxide behaves as ohmic resistance and the rectifying properties of the structures are determined by the potential barrier at the oxide-InP interface with the thermal-tunneling charge transport mechanism. The structures greatly change their characteristics in the presence of hydrogen in the ambient medium.
Received: 18.08.2014 Accepted: 25.08.2014
Citation:
E. A. Grebenshchikova, V. V. Evstropov, N. D. Il'inskaya, Yu. S. Mel'nikov, O. Yu. Serebrennikova, V. G. Sidorov, V. V. Sherstnev, Yu. P. Yakovlev, “Electrical properties of Pd-oxide-InP structures”, Fizika i Tekhnika Poluprovodnikov, 49:3 (2015), 376–378; Semiconductors, 49:3 (2015), 364–366
Linking options:
https://www.mathnet.ru/eng/phts7239 https://www.mathnet.ru/eng/phts/v49/i3/p376
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