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Fizika i Tekhnika Poluprovodnikov, 2015, Volume 49, Issue 3, Pages 421–425
(Mi phts7247)
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This article is cited in 4 scientific papers (total in 4 papers)
Manufacturing, processing, testing of materials and structures
Formation of Si nanocrystals in multilayered nanoperiodic Al$_2$O$_3$/SiO$_x$/Al$_2$O$_3$/SiO$_x$/$\dots$/Si(100) structures: Synchrotron and photoluminescence data
S. Yu. Turishcheva, V. A. Terekhova, D. A. Koyudaa, D. E. Spirina, E. V. Parinovaa, D. N. Nesterova, D. A. Grachevb, I. A. Karabanovab, A. V. Ershovb, A. I. Mashinb, È. P. Domashevskayaa a Voronezh State University
b Lobachevsky State University of Nizhny Novgorod
Abstract:
The results of X-ray absorption near-edge structure spectroscopy data obtained with synchrotron radiation for multilayered nanoperiodic Al$_2$O$_3$/SiO$_x$/Al$_2$O$_3$/SiO$_x$/$\dots$/Si(100) structures annealed at temperatures of 500–1100$^\circ$C are reported. The data show that, upon high-temperature annealing ($\sim$ 1100$^\circ$C), the structures are modified. The modification is attributed to the formation of Si nanocrystals in deep layers of the structures. At the same time, the structures exhibit size-dependent high-intensity photoluminescence in the photon-energy range 1.4–1.52 eV.
Received: 22.04.2014 Accepted: 12.05.2014
Citation:
S. Yu. Turishchev, V. A. Terekhov, D. A. Koyuda, D. E. Spirin, E. V. Parinova, D. N. Nesterov, D. A. Grachev, I. A. Karabanova, A. V. Ershov, A. I. Mashin, È. P. Domashevskaya, “Formation of Si nanocrystals in multilayered nanoperiodic Al$_2$O$_3$/SiO$_x$/Al$_2$O$_3$/SiO$_x$/$\dots$/Si(100) structures: Synchrotron and photoluminescence data”, Fizika i Tekhnika Poluprovodnikov, 49:3 (2015), 421–425; Semiconductors, 49:3 (2015), 409–413
Linking options:
https://www.mathnet.ru/eng/phts7247 https://www.mathnet.ru/eng/phts/v49/i3/p421
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