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Fizika i Tekhnika Poluprovodnikov, 2015, Volume 49, Issue 6, Pages 741–745
(Mi phts7306)
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This article is cited in 6 scientific papers (total in 6 papers)
Proceedings of the Conference ''Silicon-2014'', Irkutsk, July 7-12, 2014
Surface, interfaces, thin films
Recombination activity of interfaces in multicrystalline silicon
S. M. Peshcherovaa, E. B. Yakimovb, A. I. Nepomnyashchikha, L. A. Pavlovaa, O. V. Feklisovab a Vinogradov Institute of Geochemistry and Analytical Chemistry, Siberian Branch, Russian Academy of Sciences
b Institute of Microelectronics Technology and High-Purity Materials RAS
Abstract:
The electrical activity of grain boundaries in multicrystalline silicon grown from metallurgical silicon by the Bridgman method is investigated by the method of electron-beam induced current. The main tendencies of atypical manifestation of the local electrical activity of $\Sigma3\{111\}$ and $\Sigma9\{110\}$ special boundaries are revealed. The structural features of the grain boundaries after selective etching and the impurity-distribution characteristics in multicrystalline silicon are determined by the methods of electron backscattering diffraction and electron-probe microanalysis.
Received: 27.10.2014 Accepted: 05.11.2014
Citation:
S. M. Peshcherova, E. B. Yakimov, A. I. Nepomnyashchikh, L. A. Pavlova, O. V. Feklisova, “Recombination activity of interfaces in multicrystalline silicon”, Fizika i Tekhnika Poluprovodnikov, 49:6 (2015), 741–745; Semiconductors, 49:6 (2015), 724–728
Linking options:
https://www.mathnet.ru/eng/phts7306 https://www.mathnet.ru/eng/phts/v49/i6/p741
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