|
|
Fizika i Tekhnika Poluprovodnikov, 2015, Volume 49, Issue 9, Pages 1278–1281
(Mi phts7396)
|
|
|
|
This article is cited in 20 scientific papers (total in 20 papers)
Semiconductor physics
Characterization of field-emission cathodes based on graphene films on SiC
R. V. Konakovaa, O. B. Okhrimenkoa, A. M. Svetlichnyib, O. A. Ageevb, E. Yu. Volkovb, A. S. Kolomiytsevb, I. L. Zhityaevb, O. B. Spiridonovc a Institute of Semiconductor Physics NAS, Kiev
b Institute of Nanotechnologies, Electronics and Equipment Engineering
c Southern Laser Technology Center, Taganrog
Abstract:
The properties of a point field-emission cathode representing a structure in the form of a silicon carbide tip coated with a thin graphene film are assessed. For the point cathode with the graphene coating, the current–voltage characteristics are constructed in the Fowler–Nordheim coordinates; the work functions $\varphi$ of the point cathode are calculated by their slope. The possibility of forming heavily doped $n^+$-SiC on the point surface by the sublimation of low-threshold field emission cathodes with low threshold electric fields and field-emission currents is shown.
Received: 04.02.2014 Accepted: 19.02.2015
Citation:
R. V. Konakova, O. B. Okhrimenko, A. M. Svetlichnyi, O. A. Ageev, E. Yu. Volkov, A. S. Kolomiytsev, I. L. Zhityaev, O. B. Spiridonov, “Characterization of field-emission cathodes based on graphene films on SiC”, Fizika i Tekhnika Poluprovodnikov, 49:9 (2015), 1278–1281; Semiconductors, 49:9 (2015), 1242–1245
Linking options:
https://www.mathnet.ru/eng/phts7396 https://www.mathnet.ru/eng/phts/v49/i9/p1278
|
|