|
|
Fizika i Tekhnika Poluprovodnikov, 2014, Volume 48, Issue 4, Pages 504–508
(Mi phts7566)
|
|
|
|
This article is cited in 6 scientific papers (total in 6 papers)
Semiconductor physics
Electrical properties of MOS diodes In/TiO$_2$/$p$-CdTe
V. V. Brusab, M. I. Ilashschuka, I. G. Orletskiia, P. D. Mar'yanchuka, K. S. Ulyanytskya a Chernivtsi National University named after Yuriy Fedkovych
b Helmholtz-Zentrum Berlin für Materialien und Energie,
D-12489 Berlin, Germany
Abstract:
In/TiO$_2$/$p$-CdTe MOS diodes, which have a rectification coefficient of $K$ = 6 $\times$ 10$^3$ at an external bias of 2 V, are fabricated for the first time by means of the inexpensive spray-pyrolysis method. It is established that tunnel-recombination processes in the MOS structures under investigation for forward and reverse voltages with the participation of levels at an energy depth of 0.25 eV are the dominant current-flow mechanism. The features of the voltage-capacitance characteristics of In/TiO$_2$/$p$-CdTe MOS diodes testify to a sharp decrease in the resistance of the TiO$_2$ high-resistance layer at forward bias, which is caused by the relation between the energy parameters of components of the MOS structure under investigation.
Received: 21.03.2013 Accepted: 01.04.2013
Citation:
V. V. Brus, M. I. Ilashschuk, I. G. Orletskii, P. D. Mar'yanchuk, K. S. Ulyanytsky, “Electrical properties of MOS diodes In/TiO$_2$/$p$-CdTe”, Fizika i Tekhnika Poluprovodnikov, 48:4 (2014), 504–508; Semiconductors, 48:4 (2014), 487–491
Linking options:
https://www.mathnet.ru/eng/phts7566 https://www.mathnet.ru/eng/phts/v48/i4/p504
|
|