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Fizika i Tekhnika Poluprovodnikov, 2014, Volume 48, Issue 4, Pages 535–538
(Mi phts7572)
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This article is cited in 11 scientific papers (total in 11 papers)
Manufacturing, processing, testing of materials and structures
Defect formation and recrystallization mechanisms in silicon-on-sapphire films under ion irradiation
A. A. Shemukhina, Yu. V. Balakshinab, V. S. Chernyshab, S. A. Golubkovc, N. N. Egorovc, A. I. Sidorovc a Lomonosov Moscow State University, Skobeltsyn Institute of Nuclear Physics
b Lomonosov Moscow State University, Faculty of Physics
c Research Institute of Materials Science and Technology, Zelenograd
Abstract:
The effect of the parameters (energy, dose) of the irradiation of silicon-on-sapphire (SOS) structures with ions Si$^+$ ions on the quality of the silicon-film crystal structure after solid-phase epitaxial recrystallization and annealing is studied. It is shown that the most efficient mechanism of crystal-structure recovery is recrystallization from the silicon surface layer which is a seed.
Received: 04.06.2013 Accepted: 19.06.2013
Citation:
A. A. Shemukhin, Yu. V. Balakshin, V. S. Chernysh, S. A. Golubkov, N. N. Egorov, A. I. Sidorov, “Defect formation and recrystallization mechanisms in silicon-on-sapphire films under ion irradiation”, Fizika i Tekhnika Poluprovodnikov, 48:4 (2014), 535–538; Semiconductors, 48:4 (2014), 517–520
Linking options:
https://www.mathnet.ru/eng/phts7572 https://www.mathnet.ru/eng/phts/v48/i4/p535
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