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Fizika i Tekhnika Poluprovodnikov, 2014, Volume 48, Issue 6, Pages 763–767 (Mi phts7620)  
This article is cited in 1 scientific paper (total in 1 paper)

Surface, interfaces, thin films

Effect of ion-beam treatment during reactive high-frequency magnetron sputtering on macrostresses in ITO films

P. N. Krilov, R. M. Zakirova, I. V. Fedotova

Udmurt State University, Izhevsk
Full-text PDF (192 kB) Citations (1)
Abstract: Transparent conductive tin-doped indium-oxide films are produced by alternate processes of reactive high-frequency magnetron sputtering and ion treatment. The stressed states of the indium-tinoxide (ITO) films are studied by X-ray diffraction analysis. The effect of the technological conditions on changes in mactostresses in the ITO films is shown.
Received: 15.10.2013
Accepted: 21.10.2013
English version:
Semiconductors, 2014, Volume 48, Issue 6, Pages 743–747
DOI: https://doi.org/10.1134/S1063782614060177
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: P. N. Krilov, R. M. Zakirova, I. V. Fedotova, “Effect of ion-beam treatment during reactive high-frequency magnetron sputtering on macrostresses in ITO films”, Fizika i Tekhnika Poluprovodnikov, 48:6 (2014), 763–767; Semiconductors, 48:6 (2014), 743–747
Citation in format AMSBIB
\Bibitem{KriZakFed14}
\by P.~N.~Krilov, R.~M.~Zakirova, I.~V.~Fedotova
\paper Effect of ion-beam treatment during reactive high-frequency magnetron sputtering on macrostresses in ITO films
\jour Fizika i Tekhnika Poluprovodnikov
\yr 2014
\vol 48
\issue 6
\pages 763--767
\mathnet{http://mi.mathnet.ru/phts7620}
\elib{https://elibrary.ru/item.asp?id=22018862}
\transl
\jour Semiconductors
\yr 2014
\vol 48
\issue 6
\pages 743--747
\crossref{https://doi.org/10.1134/S1063782614060177}
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    • This publication is cited in the following 1 articles:
    Citing articles in Google Scholar: Russian citations, English citations
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