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Fizika i Tekhnika Poluprovodnikov, 2013, Volume 47, Issue 5, Pages 675–683
(Mi phts7907)
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This article is cited in 28 scientific papers (total in 28 papers)
Semiconductor physics
A general simulation procedure for the electrical characteristics of metal-insulator-semiconductor tunnel structures
M. I. Vexlera, S. È. Tyaginovab, Yu. Yu. Illarionovac, Yew Kwang Singd, Ang Diing Shenpd, V. V. Fedorova, D. V. Isakovc a Ioffe Institute, St. Petersburg
b TU Vienna, Institute for Mictroelectronics,
1040 Wien, Austria
c Singapore Institute of Manufacturing Technology,
638075 Singapore
d Nanyang Technological University, 639798 Singapore
Abstract:
The algorithm is suggested for calculating the I–V characteristics of a voltage- or current-controlled metal-tunnel-thin insulator-semiconductor system. The basic underlying physical models are discussed. Applicability of the algorithm is confirmed by a comparison of the simulation results with the measurement data obtained by the authors and borrowed from the literature, for several different structures. The presented information is supposed to suffice for calculating the electrical characteristics of the investigated structures with the various combinations of materials: metal or polysilicon gate, single-layer or stacked insulator, and semiconductor with any doping type and level.
Received: 06.08.2012 Accepted: 28.08.2012
Citation:
M. I. Vexler, S. È. Tyaginov, Yu. Yu. Illarionov, Yew Kwang Sing, Ang Diing Shenp, V. V. Fedorov, D. V. Isakov, “A general simulation procedure for the electrical characteristics of metal-insulator-semiconductor tunnel structures”, Fizika i Tekhnika Poluprovodnikov, 47:5 (2013), 675–683; Semiconductors, 47:5 (2013), 686–694
Linking options:
https://www.mathnet.ru/eng/phts7907 https://www.mathnet.ru/eng/phts/v47/i5/p675
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