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Fizika i Tekhnika Poluprovodnikov, 2013, Volume 47, Issue 8, Pages 1137–1143
(Mi phts7999)
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This article is cited in 2 scientific papers (total in 2 papers)
Manufacturing, processing, testing of materials and structures
Effect of annealing in argon on the properties of thermally deposited gallium-oxide films
V. M. Kalygina, V. V. Vishnikina, A. N. Zarubin, V. A. Novikov, Yu. S. Petrova, O. P. Tolbanov, A. V. Tyazhev, S. Yu. Tsupiy, T. M. Yaskevich Siberian Physical-Technical Institute of the Tomsk State University
Abstract:
The effect of the annealing temperature on the I–V, C–I, and G–V characteristics and transparency of gallium-oxide films is investigated. The films are fabricated by the thermal evaporation of Ga$_2$O$_3$ powder on n-GaAs wafers. It is shown that the films which are amorphous after deposition crystallize upon annealing at temperatures $T_{\mathrm{an}}\ge$ 800$^\circ$C. The electrical characteristics and photoresponse of the V/Ni–GaAs–GaAs–Ga$_x$O$_y$–V/Ni samples to visible radiation depend on the structure and phase composition of the films.
Received: 20.12.2012 Accepted: 10.01.2013
Citation:
V. M. Kalygina, V. V. Vishnikina, A. N. Zarubin, V. A. Novikov, Yu. S. Petrova, O. P. Tolbanov, A. V. Tyazhev, S. Yu. Tsupiy, T. M. Yaskevich, “Effect of annealing in argon on the properties of thermally deposited gallium-oxide films”, Fizika i Tekhnika Poluprovodnikov, 47:8 (2013), 1137–1143; Semiconductors, 47:8 (2013), 1130–1136
Linking options:
https://www.mathnet.ru/eng/phts7999 https://www.mathnet.ru/eng/phts/v47/i8/p1137
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