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Fizika i Tekhnika Poluprovodnikov, 2012, Volume 46, Issue 2, Pages 214–218
(Mi phts8151)
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Semiconductor physics
Characteristics of InGaP/InGaAs pseudomorphic high electron mobility transistors with triple $\delta$-doped sheets
Kuei-Yi Chua, Meng-Hsueh Chiangb, Shiou-Ying Chengb, Wen-Chau Liua a Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, Tainan, Taiwan, 70101, Republic of China
b Department of Electronic Engineering, National II an University, I-Lan, Taiwan, Republic of China
Abstract:
Fundamental and insightful characteristics of InGaP/InGaAs double channel pseudomorphic high electron mobility transistors (DCPHEMTs) with graded and uniform triple $\delta$-doped sheets are coomprehensively studied and demonstrated. To gain physical insight, band diagrams, carrier densities, and direct current characteristics of devices are compared and investigated based on the 2D semiconductor simulator, Atlas. Due to uniform carrier distribution and high electron density in the double InGaAs channel, the DCPHEMT with graded triple $\delta$-doped sheets exhibits better transport properties, higher and linear transconductance, and better drain current capability as compared with the uniformly triple $\delta$-doped counterpart. The DCPHEMT with graded triple $\delta$-doped structure is fabricated and tested, and the experimental data are found to be in good agreement with simulated results.
Received: 21.03.2011 Accepted: 28.06.2011
Citation:
Kuei-Yi Chu, Meng-Hsueh Chiang, Shiou-Ying Cheng, Wen-Chau Liu, “Characteristics of InGaP/InGaAs pseudomorphic high electron mobility transistors with triple $\delta$-doped sheets”, Fizika i Tekhnika Poluprovodnikov, 46:2 (2012), 214–218; Semiconductors, 46:2 (2012), 203–207
Linking options:
https://www.mathnet.ru/eng/phts8151 https://www.mathnet.ru/eng/phts/v46/i2/p214
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