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Fizika i Tekhnika Poluprovodnikov, 2012, Volume 46, Issue 5, Pages 616–619
(Mi phts8229)
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This article is cited in 5 scientific papers (total in 5 papers)
Electronic properties of semiconductors
Effect of charged dislocation walls on mobility in GaN epitaxial layers
S. E. Krasavin Joint Institute for Nuclear Research, Dubna, Moscow region
Abstract:
A theoretical model in the context of a conventional representation on traditional notion concerning Read cylinders for interpretation of mobility collapse as a function of the concentration of free carriers in GaN-based films is suggested. Along with phonon and impurity scattering mechanisms, electron scattering due to charged dislocations embedded into the walls is taken into account in the model. An expression is obtained for the height of the drift barrier depending on the concentration of free carriers. Based on the derived equations, the dependence of the location of the mobility minimum on the dislocation structure is interpreted.
Received: 28.09.2011 Accepted: 20.10.2011
Citation:
S. E. Krasavin, “Effect of charged dislocation walls on mobility in GaN epitaxial layers”, Fizika i Tekhnika Poluprovodnikov, 46:5 (2012), 616–619; Semiconductors, 46:5 (2012), 598–601
Linking options:
https://www.mathnet.ru/eng/phts8229 https://www.mathnet.ru/eng/phts/v46/i5/p616
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