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Fizika i Tekhnika Poluprovodnikov, 2012, Volume 46, Issue 12, Pages 1561–1565
(Mi phts8392)
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This article is cited in 1 scientific paper (total in 1 paper)
XVI Symposium "Nanophysics and Nanoelectronics", Nizhni Novgorod, March 12-16, 2012
Admittance spectroscopy of ring diode InGaAs/InAlAs/InP quantum-well structures
S. V. Tikhova, N. V. Baidusb, A. A. Biryukovb, V. E. Degtyarova a Lobachevsky State University of Nizhny Novgorod
b Scientific-Research Physicotechnical Institute at the Nizhnii Novgorod State University, Nizhnii Novgorod
Abstract:
The admittance of ring planar diode Au/InGaAs/InP and Au/InGaAs/InAlAs heteronanostructures on $i$-InP has been studied. The structures are constituted by a silicon $\delta$-doped layer and an InGaAs quantum well (QW) in InP or InAlAs epitaxial layers. An analysis of the capacitance-voltage and conductance-voltage characteristics yielded distribution profiles of the electron concentration and mobility in the vicinity of the QW and $\delta$-doped layer. It is shown that lowering the temperature leads to an increase in the electron concentration and mobility in the QW.
Received: 15.04.2012 Accepted: 25.04.2012
Citation:
S. V. Tikhov, N. V. Baidus, A. A. Biryukov, V. E. Degtyarov, “Admittance spectroscopy of ring diode InGaAs/InAlAs/InP quantum-well structures”, Fizika i Tekhnika Poluprovodnikov, 46:12 (2012), 1561–1565; Semiconductors, 46:12 (2012), 1524–1528
Linking options:
https://www.mathnet.ru/eng/phts8392 https://www.mathnet.ru/eng/phts/v46/i12/p1561
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