Fizika i Tekhnika Poluprovodnikov
RUS  ENG    JOURNALS   PEOPLE   ORGANISATIONS   CONFERENCES   SEMINARS   VIDEO LIBRARY   PACKAGE AMSBIB  
General information
Latest issue
Archive

Search papers
Search references

RSS
Latest issue
Current issues
Archive issues
What is RSS



Fizika i Tekhnika Poluprovodnikov:
Year:
Volume:
Issue:
Page:
Find






Personal entry:
Login:
Password:
Save password
Enter
Forgotten password?
Register


Fizika i Tekhnika Poluprovodnikov, 2011, Volume 45, Issue 3, Pages 289–294 (Mi phts8475)  

This article is cited in 3 scientific papers (total in 3 papers)

Non-electronic properties of semiconductors (atomic structure, diffusion)

Mechanisms of defect formation in ingots of 4H silicon carbide polytype

D. D. Avrova, A. V. Bulatova, S. I. Dorozhkina, A. O. Lebedevb, Yu. M. Tairova, A. Yu. Fadeeva

a Saint Petersburg Electrotechnical University "LETI"
b Ioffe Institute, St. Petersburg
Abstract: The methods of optical microscopy and X-ray diffractometry have been used to study the features of defect structure in ingots of the SiC-4H polytype; the ingots have featured different diameters and have been grown by the modified Lely method on seeds with deviations of several degrees from the exact orientation (0001)C in the direction $\langle11\bar20\rangle$ (off-cut (0001) seeds). The slip bands observed in the crystals are extended along the $[11\bar20]$ direction and correspond to the secondary slip system of threading dislocations $a/3\langle11\bar20\rangle$ $\{\bar1100\}$ for hexagonal close packing (HCP) crystals. Low-angle dislocation boundaries directed along $[1\bar100]$ accommodate the disorientation of neighboring domains, which results from their mutual rotation around the [0001] axis. Enlargement of ingots leads to some increase in the dislocation density, mainly due to threading edge dislocations. The average density of micropipes is in the range of 5–20 cm$^{-2}$ and practically remains unchanged as the ingot size is increased.
Received: 30.06.2010
Accepted: 05.07.2010
English version:
Semiconductors, 2011, Volume 45, Issue 3, Pages 277–283
DOI: https://doi.org/10.1134/S1063782611030055
Bibliographic databases:
Document Type: Article
Language: Russian
Citation: D. D. Avrov, A. V. Bulatov, S. I. Dorozhkin, A. O. Lebedev, Yu. M. Tairov, A. Yu. Fadeev, “Mechanisms of defect formation in ingots of 4H silicon carbide polytype”, Fizika i Tekhnika Poluprovodnikov, 45:3 (2011), 289–294; Semiconductors, 45:3 (2011), 277–283
Citation in format AMSBIB
\Bibitem{AvrBulDor11}
\by D.~D.~Avrov, A.~V.~Bulatov, S.~I.~Dorozhkin, A.~O.~Lebedev, Yu.~M.~Tairov, A.~Yu.~Fadeev
\paper Mechanisms of defect formation in ingots of 4\emph{H} silicon carbide polytype
\jour Fizika i Tekhnika Poluprovodnikov
\yr 2011
\vol 45
\issue 3
\pages 289--294
\mathnet{http://mi.mathnet.ru/phts8475}
\elib{https://elibrary.ru/item.asp?id=20318531}
\transl
\jour Semiconductors
\yr 2011
\vol 45
\issue 3
\pages 277--283
\crossref{https://doi.org/10.1134/S1063782611030055}
Linking options:
  • https://www.mathnet.ru/eng/phts8475
  • https://www.mathnet.ru/eng/phts/v45/i3/p289
  • This publication is cited in the following 3 articles:
    Citing articles in Google Scholar: Russian citations, English citations
    Related articles in Google Scholar: Russian articles, English articles
    Fizika i Tekhnika Poluprovodnikov Fizika i Tekhnika Poluprovodnikov
    Statistics & downloads:
    Abstract page:24
    Full-text PDF :8
     
      Contact us:
     Terms of Use  Registration to the website  Logotypes © Steklov Mathematical Institute RAS, 2026