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Publications in Math-Net.Ru |
Citations |
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2025 |
| 1. |
N. V. Vostokov, M. N. Drozdov, M. A. Kalinnikov, S. A. Kraev, D. N. Lobanov, P. A. Yunin, “Schottky diodes based on monocrystalline Al/AlGaN/GaN heterostructures for zero-bias microwave detection”, Zhurnal Tekhnicheskoi Fiziki, 95:6 (2025), 1148–1156 |
| 2. |
M. A. Lobaev, D. B. Radishev, A. L. Vikharev, A. M. Gorbachev, S. A. Bogdanov, V. A. Isaev, S. A. Kraev, A. I. Okhapkin, E. A. Arkhipova, P. A. Yunin, N. V. Vostokov, E. V. Demidov, M. N. Drozdov, “CVD diamond structures with a $p$–$n$ junction – diodes and transistors”, Zhurnal Tekhnicheskoi Fiziki, 95:3 (2025), 540–548 |
| 3. |
M. A. Lobaev, D. B. Radishev, A. L. Vikharev, A. M. Gorbachev, S. A. Bogdanov, V. A. Isaev, V. A. Kukushkin, S. A. Kraev, A. I. Okhapkin, E. A. Arkhipova, E. V. Demidov, M. N. Drozdov, “Study of photo and electroluminescence of nitrogen-related color centers in a diamond $p$–$i$–$n$ diode”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 51:10 (2025), 48–51 |
| 4. |
M. A. Lobaev, D. B. Radishev, A. L. Vikharev, A. M. Gorbachev, S. A. Bogdanov, V. A. Isaev, V. A. Kukushkin, S. A. Kraev, A. I. Okhapkin, E. A. Arkhipova, E. V. Demidov, M. N. Drozdov, R. I. Khaibullin, “Electroluminescence of germanium-vacancy color centers in a diamond $p$–$i$–$n$ diode”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 51:8 (2025), 3–6 |
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2024 |
| 5. |
E. A. Arkhipova, M. N. Drozdov, S. A. Kraev, O. I. Khrykin, A. I. Okhapkin, M. A. Lobaev, A. L. Vikharev, V. A. Isaev, S. A. Bogdanov, “Non-annealed ohmic contacts with reduced resistance to $p$- and $n$-type epitaxial layers of diamond and their thermal stability”, Fizika i Tekhnika Poluprovodnikov, 58:8 (2024), 409–414 |
| 6. |
A. I. Okhapkin, S. A. Korolev, S. A. Kraev, P. A. Yunin, E. A. Arkhipova, “Electrophysical properties of multilayer DLC films with different $sp^3$-phase contents”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 50:17 (2024), 30–33 |
| 7. |
A. I. Okhapkin, S. A. Kraev, P. A. Yunin, S. A. Korolev, D. B. Radishev, N. Kumar, “Thermal annealing of multilayer films of diamond-like carbon with a variable content of $sp^3$-phase”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 50:13 (2024), 12–15 |
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2023 |
| 8. |
A. I. Okhapkin, M. N. Drozdov, P. A. Yunin, S. A. Kraev, D. B. Radishev, “Plasma chemical deposition of hydrogenated DLC films with different hydrogen and $sp^3$-hybrid carbon content”, Fizika i Tekhnika Poluprovodnikov, 57:5 (2023), 309–312 |
| 9. |
V. B. Shmagin, A. V. Novikov, A. N. Yablonskii, M. V. Stepikhova, D. V. Yurasov, A. N. Mikhaylov, D. I. Tetelbaum, E. E. Rodyakina, E. E. Morozova, D. V. Shengurov, S. A. Kraev, P. A. Yunin, M. V. Shaleev, A. I. Belov, “Planar (lateral) light-emitting diodes with Ge(Si) nanoislands embedded in a photonic crystal”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 49:22 (2023), 12–15 |
| 10. |
A. I. Okhapkin, S. A. Kraev, V. M. Daniltsev, M. N. Drozdov, S. A. Korolev, M. V. Zorina, “Surface treatment of gallium arsenide after etching in C$_2$F$_5$Cl-plasma”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 49:19 (2023), 39–42 |
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2022 |
| 11. |
A. I. Okhapkin, S. A. Kraev, E. A. Arkhipova, V. M. Daniltsev, O. I. Khrykin, P. A. Yunin, M. N. Drozdov, “Influence of chloropentafluoroethane inductively coupled plasma parameters on the rate and characteristics of gallium arsenide etching”, Fizika i Tekhnika Poluprovodnikov, 56:7 (2022), 685–688 |
| 12. |
N. V. Vostokov, M. N. Drozdov, S. A. Kraev, O. I. Khrykin, P. A. Yunin, “Effect of thermal annealing on the transport properties of Ti/AlGaN/GaN low-barrier Mott diodes”, Fizika i Tekhnika Poluprovodnikov, 56:7 (2022), 627–629 |
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2021 |
| 13. |
A. I. Okhapkin, S. A. Kraev, E. A. Arkhipova, V. M. Daniltsev, O. I. Khrykin, P. A. Yunin, M. N. Drozdov, “Effect of the chloropentafluoroethane additive in chlorine-containing plasma on the etching rate and etching-profile characteristics of gallium arsenide”, Fizika i Tekhnika Poluprovodnikov, 55:10 (2021), 837–840 ; Semiconductors, 55:11 (2021), 865–868 |
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| 14. |
A. L. Vikharev, S. A. Bogdanov, N. M. Ovechkin, O. A. Ivanov, D. B. Radishev, A. M. Gorbachev, M. A. Lobaev, A. Ya. Vul', A. T. Dideikin, S. A. Kraev, S. A. Korolev, “Study of undoped nanocrystalline diamond films grown by microwave plasma-assisted chemical vapor deposition”, Fizika i Tekhnika Poluprovodnikov, 55:1 (2021), 49–58 ; Semiconductors, 55:1 (2021), 66–75 |
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2020 |
| 15. |
Yu. N. Drozdov, S. A. Kraev, A. I. Okhapkin, V. M. Daniltsev, E. V. Skorokhodov, “Features of the vapor-phase epitaxy of GaAs on nonplanar substrates”, Fizika i Tekhnika Poluprovodnikov, 54:9 (2020), 958–961 ; Semiconductors, 54:9 (2020), 1147–1149 |
| 16. |
A. I. Okhapkin, P. A. Yunin, E. A. Arkhipova, S. A. Kraev, S. A. Korolev, M. N. Drozdov, V. I. Shashkin, “Formation of ohmic contacts to a diamond-like carbon layer deposited on a dielectric diamond substrate”, Fizika i Tekhnika Poluprovodnikov, 54:9 (2020), 865–867 ; Semiconductors, 54:9 (2020), 1056–1058 |
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| 17. |
P. A. Yunin, A. I. Okhapkin, M. N. Drozdov, S. A. Korolev, E. A. Arkhipova, S. A. Kraev, Yu. N. Drozdov, V. I. Shashkin, D. B. Radishev, “Modification of the ratio between $sp^2/sp^3$-hybridized carbon components in PECVD diamond-like films”, Fizika i Tekhnika Poluprovodnikov, 54:9 (2020), 855–858 ; Semiconductors, 54:9 (2020), 1047–1050 |
| 18. |
M. N. Drozdov, E. A. Arkhipova, Yu. N. Drozdov, S. A. Kraev, V. I. Shashkin, A. E. Parafin, M. A. Lobaev, A. L. Vikharev, A. M. Gorbachev, D. B. Radishev, V. A. Isaev, S. A. Bogdanov, “The use of pulsed laser annealing to form ohmic Mo/Ti contacts to diamond”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 46:11 (2020), 34–38 ; Tech. Phys. Lett., 46:6 (2020), 551–555 |
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2019 |
| 19. |
M. N. Drozdov, E. V. Demidov, Yu. N. Drozdov, S. A. Kraev, V. I. Shashkin, E. A. Arkhipova, M. A. Lobaev, A. L. Vikharev, A. M. Gorbachev, D. B. Radishev, V. A. Isaev, S. A. Bogdanov, “Formation of low-resistivity Au/Mo/Ti ohmic contacts to $p$-diamond epitaxial layers”, Zhurnal Tekhnicheskoi Fiziki, 89:12 (2019), 1923–1932 ; Tech. Phys., 64:12 (2019), 1827–1836 |
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| 20. |
E. A. Arkhipova, E. V. Demidov, M. N. Drozdov, S. A. Kraev, V. I. Shashkin, M. A. Lobaev, A. L. Vikharev, A. M. Gorbachev, D. B. Radishev, V. A. Isaev, S. A. Bogdanov, “Ohmic contacts to CVD diamond with boron-doped $\delta$ layers”, Fizika i Tekhnika Poluprovodnikov, 53:10 (2019), 1386–1390 ; Semiconductors, 53:10 (2019), 1348–1352 |
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| 21. |
N. V. Vostokov, V. M. Daniltsev, S. A. Kraev, V. L. Kryukov, E. V. Skorokhodov, S. S. Strelchenko, V. I. Shashkin, “Vertical field-effect transistor with control $p$–$n$-junction based on GaAs”, Fizika i Tekhnika Poluprovodnikov, 53:10 (2019), 1311–1314 ; Semiconductors, 53:10 (2019), 1279–1281 |
| 22. |
A. I. Okhapkin, P. A. Yunin, M. N. Drozdov, S. A. Korolev, S. A. Kraev, E. A. Arkhipova, E. V. Skorokhodov, P. A. Bushuikin, V. I. Shashkin, “Plasma-chemical deposition of diamond-like films onto the surface of heavily doped single-crystal diamond”, Fizika i Tekhnika Poluprovodnikov, 53:9 (2019), 1229–1232 ; Semiconductors, 53:9 (2019), 1203–1206 |
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| 23. |
M. N. Drozdov, Yu. N. Drozdov, A. I. Okhapkin, S. A. Kraev, M. A. Lobaev, “A new approach to tof-sims analysis of the phase composition of carbon-containing materials”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 45:2 (2019), 50–54 ; Tech. Phys. Lett., 45:1 (2019), 48–52 |
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2018 |
| 24. |
A. I. Okhapkin, P. A. Yunin, M. N. Drozdov, S. A. Kraev, E. V. Skorokhodov, V. I. Shashkin, “Plasma chemical etching of gallium arsenide in C$_{2}$F$_{5}$Cl-based inductively coupled plasma”, Fizika i Tekhnika Poluprovodnikov, 52:11 (2018), 1362–1365 ; Semiconductors, 52:11 (2018), 1473–1476 |
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2017 |
| 25. |
A. I. Okhapkin, S. A. Korolev, P. A. Yunin, M. N. Drozdov, S. A. Kraev, O. I. Khrykin, V. I. Shashkin, “Low-temperature deposition of SiN$_ x$ films in SiH$_{4}$/Ar + N$_{2}$ inductively coupled plasma under high silane dilution with argon”, Fizika i Tekhnika Poluprovodnikov, 51:11 (2017), 1503–1506 ; Semiconductors, 51:11 (2017), 1449–1452 |
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2016 |
| 26. |
V. M. Daniltsev, E. V. Demidov, M. N. Drozdov, Yu. N. Drozdov, S. A. Kraev, E. A. Surovegina, V. I. Shashkin, P. A. Yunin, “Heavily doped GaAs:Te layers grown by MOVPE using diisopropyl telluride as a source”, Fizika i Tekhnika Poluprovodnikov, 50:11 (2016), 1459–1462 ; Semiconductors, 50:11 (2016), 1439–1442 |
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